CHARM’s Joshua Zide Awarded AVS Fellowship
Dr. Joshua M.O. Zide recently received an American Vacuum Society (AVS) Fellowship in recognition of “sustained and outstanding technical contribution in areas of interest to AVS,” which specifically honors his contributions to molecular beam epitaxy (MBE) growth of dissimilar materials heterostructures and interfaces. The citation recognizes that Zide has spent the past 20 years of his career exploring the growth of novel materials with a focus on new physics and applications. A list of the Class of 2021 AVS Fellows can be found here.
Zide, co-Lead of CHARM’s IRG2, is a Professor and Graduate Program Director in the Department of Materials Science and Engineering at the University of Delaware. Zide also serves as Associate Editor of the Journal of Vacuum Science & Technology and is Director of UD’s Materials Growth Facility. He received his BS with Distinction in Materials Science Engineering from Stanford University and completed his Ph.D. in Materials at the University of California, Santa Barbara in 2007. Zide has received the International Thermoelectric Society Goldsmid Award (2007), a Young Investigator Award from the Office of Naval Research (2009), the North American Molecular Beam Epitaxy Young Investigator (2011), a Department of Energy Early Career Award (2012), and the AVS Peter Mark Memorial Award (2014). His research interests include the molecular beam epitaxy growth of novel semiconductors and composite electronic materials for energy conversion and optoelectronic devices. Learn more about Professor Zide’s research on his lab site.